纯锆在400-850℃纯氧中的氧化OXIDATION OF THE PUREZIRCONIUM IN PURE OXYGEN IN TEMPERATURE RANGE 400-850℃
陈鹤鸣,马春来
摘要(Abstract):
本文研究了金属純锆在摄氏400—850度温度范围內150亳米水銀柱干燥純氧中的氧化动力学,用x射綫衍射,金相和扫描电鏡研究了锆的氧化层,特别是細致地研究了氧化皮的結构。在高溫下氧化速率很好地符合抛物綫規律;中溫下初始快速氧化和随后的氧化也与抛物綫規律吻合得很好;在摄氏850度氧化約100小时发生抛物綫規律向直綫規律的轉折。用最小二乘法由氧化速度常数算得激活能为30.8卡/克分子。
关键词(KeyWords):
基金项目(Foundation):
作者(Author): 陈鹤鸣,马春来
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